Applications of electrochromic devices with reflective structure

ABSTRACT

Electrochromic devices with reflective structure and related manufacturing methods are provided. One of the electrochromic devices includes a bottom electrode layer, an electrochromic layer on the bottom electrode layer, an electrolyte layer on the electrochromic layer, a charge storage layer on the electrolyte layer, and a top electrode on the charge storage layer. The transmittance of the electrochromic device changes in response to a voltage applied between the bottom electrode layer and the top electrode layer. One of the bottom and the top electrode layers is a reflective conductive layer, while the other being a transparent conductive layer. This electrochromic device has a simplified structure due to the removal of a separated reflective film, which also results in simplified manufacturing process.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of U.S. patent application Ser. No.16/666,686, filed on Oct. 29, 2019, which is incorporated herein byreference in its entirety.

TECHNICAL FIELD

This application relates generally to technical field of electronics,and more specifically, to electrochromic devices with reflectivestructures.

BACKGROUND

Electrochromic materials can change their optical characteristics, suchas transmittance, reflectance, absorptance or emittance under electricalcurrent or voltage, and thus have numerous applications in scenariosthat require devices that have adjustable optical properties (e.g.,dimmable devices). For example, dimmable mirrors and dimmable windowsthat are made of electrochromic materials have been ubiquitously used invarious places, including vehicles, airplanes, and buildings, to providebetter adaption for different lighting conditions.

The manufacturing of dimmable devices with electrochromic materials,however, remains a challenging task due to complicated processes to dealwith various component layers and issues related to sealing anddiffusion of electrochromic materials during the manufacturing process.Therefore, an efficient and reliable manufacturing process is desirable.

SUMMARY

In view of the limitations of conventional technologies described above,this inventive concept provides electrochromic devices with reflectivestructure and related manufacturing methods that address at least someof these limitations.

This inventive concept first provides an electrochromic device. Theelectrochromic device may include a bottom electrode layer, anelectrochromic layer on the bottom electrode layer, an electrolyte layeron the electrochromic layer, a charge storage layer on the electrolytelayer, and a top electrode layer on the charge storage layer. Atransmittance of the electrochromic device may change in response to avoltage applied between the bottom electrode layer and the top electrodelayer. One of the bottom electrode layer and the top electrode layer maybe a reflective conductive layer, and another of the bottom electrodelayer and the top electrode layer may be a transparent conductive layer.

In some embodiments, in the aforementioned device, the bottom electrodelayer and the top electrode layer may each comprise polyethyleneterephthalate (PET) and indium tin oxide (ITO).

In some embodiments, in the aforementioned device, the bottom electrodelayer and the top electrode layer may each have a sheet resistance in arange of 0.01 Ω/sq to 200 Ω/sq.

In some embodiments, in the aforementioned device, the transmittance mayrange from 0.1% to 99%.

In some embodiments, the aforementioned device may further comprise atop glass panel and a bottom glass panel. The bottom electrode layer,the electrochromic layer, the electrolyte layer, the charge storagelayer, and the top electrode layer may be sandwiched by the top glasspanel and the bottom glass panel.

This inventive concept further provides another electrochromic device.The electrochromic device may include a bottom electrode layer, anelectrochromic layer on the bottom electrode layer, an electrolyte layeron the electrochromic layer, a charge storage layer on the electrolytelayer, a top electrode layer on the charge storage layer, a top glasspanel and a bottom glass panel. The bottom electrode layer, theelectrochromic layer, the electrolyte layer, the charge storage layer,and the top electrode layer may be sandwiched by the top glass panel andthe bottom glass panel. The electrochromic device may further include areflective layer located either on a side of the top glass panelcontacting the top glass panel or on a side of the bottom glass panelcontacting the bottom glass panel. A transmittance of the electrochromicdevice changes in response to a voltage applied between the bottomelectrode layer and the top electrode layer.

In some embodiments, in the aforementioned device, the reflective layermay be a metallic layer made of Ag, Al, Cr, or Au, or a Bragg mirrorcomprising a plurality of dielectric layers.

In some embodiments, in the aforementioned device, the bottom electrodelayer and the top electrode layer may each have a sheet resistance in arange of 0.01 Ω/sq to 200 Ω/sq.

In some embodiments, in the aforementioned device, the transmittance mayrange from 0.1% to 99%.

This inventive concept further provides an electrochromic devicemanufacturing method. The method may include: providing a top electrodelayer, forming a charge storage layer on the top electrode layer,providing a bottom electrode layer, forming an electrochromic layer onthe bottom electrode layer, and forming an electrolyte layer sandwichedby the charge storage layer and the electrochromic layer. Theelectrochromic layer, the electrolyte layer, and the charge storagelayer may be sandwiched by the top electrode layer and the bottomelectrode layer. A transmittance of the electrochromic device may changein response to a voltage applied between the bottom electrode layer andthe top electrode layer.

In some embodiments, in the aforementioned method, the bottom electrodelayer and the top electrode layer may each have a sheet resistance in arange of 0.01 Ω/sq to 200 Ω/sq.

In some embodiments, in the aforementioned method, the forming a chargestorage layer on the top electrode layer may comprise depositing thecharge storage layer on the top electrode layer using a wet process,such as spin-coating, ink-jetting, slot-die coating, dip-coating,gravure-coating, spray-coating, blade-coating, screen printing, mayerbar coating, relief printing, etc., and the forming an electrochromiclayer on the bottom electrode layer may comprise: depositing theelectrochromic layer on the bottom electrode layer using a wet process,such as spin-coating, ink-jetting, slot-die coating, dip-coating,gravure-coating, spray-coating, blade-coating, screen printing, mayerbar coating, relief printing, etc.

In some embodiments, in the aforementioned method, the forming anelectrolyte layer sandwiched by the charge storage layer and theelectrochromic layer may comprise: depositing the electrolyte layer onthe electrochromic layer, laminating the charge storage layer along withthe top electrode on the electrolyte layer, and curing the electrolytelayer.

In some embodiments, in the aforementioned method, the forming anelectrolyte layer sandwiched by the charge storage layer and theelectrochromic layer may comprise: depositing the electrolyte layer onthe charge storage layer, laminating the electrochromic layer along withthe bottom electrode on the electrolyte layer, and curing theelectrolyte layer.

In some embodiments, in the aforementioned method, the forming anelectrolyte layer sandwiched by the charge storage layer and theelectrochromic layer may include: fixing the top electrode layer to thebottom electrode layer, with the charge storage layer and theelectrochromic layer located between the top electrode layer and thebottom electrode layer and separated by a space; and filling the spacewith electrolyte liquid by a vacuum-and-siphon process to form theelectrolyte layer. The vacuum-and-siphon process may include: providingedge seals at edge areas of the electrochromic layer and the chargestorage layer to seal the space, vacuuming the space, and siphoningelectrolyte liquid to fill the space.

In some embodiments, the aforementioned method may further include:forming a top glass panel, a bottom glass panel and a reflective layer.The bottom electrode layer, the electrochromic layer, the electrolytelayer, the charge storage layer, and the top electrode layer may besandwiched by the top glass panel and the bottom glass panel. Thereflecting layer may be located on a side of the top glass panelcontacting the top glass panel, or on a side of the bottom glass panelcontacting the bottom glass panel.

In some embodiments, in the aforementioned method, the reflective layermay be a metallic layer made of Ag, Al, Cr, or Au.

In some embodiments, in the aforementioned method, the reflective layermay be a Bragg mirror comprising a plurality of dielectric layers.

In some embodiments, in the aforementioned method, one of the bottomelectrode layer and the top electrode layer may be a reflectiveconductive layer, and the other of the bottom electrode layer and thetop electrode layer may be a transparent conductive layer.

In some embodiments, the aforementioned method may further include:forming a top glass panel and a bottom glass panel. The bottom electrodelayer, the electrochromic layer, the electrolyte layer, the chargestorage layer, and the top electrode layer may be sandwiched by the topglass panel and the bottom glass panel.

In some disclosed electrochromic devices, one of the top electrode layerand the bottom electrode layer may be a reflective layer for reflectinglight, while the other may be a transparent layer. These devices have asimplified structure due to the removal of a dedicated reflective layer,which may also result in simplified manufacturing process since theprocess of pasting a reflective film in the electrochromic device is nolonger necessary. Additionally, this inventive concept discloses using avacuum-and-siphon process to form the electrolyte layer, which mayfurther improve the efficiency of manufacturing process.

These and other features of the systems, methods, as well as the methodsof operation and functions of the related elements of structure willbecome more apparent upon consideration of the following description andthe appended claims with reference to the accompanying drawings, all ofwhich form a part of this specification. Like reference numerals in thedrawings may designate corresponding parts in the various figures. It isto be expressly understood that the drawings are for purposes ofillustration and description only and are not intended as a definitionof the limits of the inventive concept. It is to be understood that theforegoing general description and the following detailed description areexemplary and explanatory only, and are not restrictive of the inventiveconcept, as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

Preferred and non-limiting embodiments of this inventive concept may bemore readily understood by referring to the accompanying drawings. Theaccompanying drawings, which are incorporated in and constitute a partof the description, illustrate embodiments in accordance with thisinventive concept and, together with the description, serve to explainthe disclosed inventive concept. It is apparent that these drawingspresent only some embodiments of the inventive concept and persons ofordinary skill in the art may obtain drawings of other embodiments fromthem without creative effort.

FIG. 1. is a schematic diagram of an electrochromic device in accordancewith one embodiment of this inventive concept.

FIG. 2. is a three-dimensional exploded structural diagram illustratingan electrochromic device in accordance with one embodiment of thisinventive concept.

FIGS. 3a and 3b are three-dimensional exploded structural diagramsillustrating electrochromic devices in accordance with one or moreembodiments of this inventive concept.

FIGS. 4a and 4b are schematic diagrams of electrochromic devices inaccordance with one or more embodiments of this inventive concept.

FIG. 5 is a flowchart illustrating an electrochromic devicemanufacturing method in accordance with one embodiment of this inventiveconcept.

FIG. 6 is a flowchart illustrating an electrochromic devicemanufacturing method in accordance with one embodiment of this inventiveconcept.

FIG. 7 is a diagram illustrating a vacuum-and-siphon process inaccordance with one embodiment of this inventive concept.

FIG. 8 is a diagram illustrating two distinct modes or states inaccordance with embodiments of the electrochromic device described withrespect to FIGS. 1, 2, 3 a, 3 b, 4 a, and 4 b.

DETAILED DESCRIPTION OF THE INVENTION

Specific, non-limiting embodiments of the present invention will now bedescribed with reference to the drawings. Particular features andaspects of any embodiment disclosed herein may be used and/or combinedwith particular features and aspects of any other embodiment disclosedherein. It should be understood that such embodiments are by way ofexample and are merely illustrative of a number of embodiments withinthe scope of the present invention. Various changes and modificationsobvious to one skilled in the art to which the present inventionpertains are deemed to be within the spirit, scope and contemplation ofthe present invention as further defined in the appended claims.

While examples and features of disclosed principles are describedherein, modifications, adaptations, and other implementations arepossible without departing from the spirit and scope of the disclosedembodiments. Also, the words “comprising,” “having,” “containing,” and“including,” and other similar forms are intended to be equivalent inmeaning and be open ended in that an item or items following any one ofthese words is not meant to be an exhaustive listing of such item oritems, or meant to be limited to only the listed item or items. It mustalso be noted that as used herein and in the appended claims, thesingular forms “a,” “an,” and “the” include plural references unless thecontext clearly dictates otherwise.

The embodiments illustrated herein are described in sufficient detail toenable those skilled in the art to practice the teachings disclosed.Other embodiments may be used and derived therefrom, such thatstructural and logical substitutions and changes may be made withoutdeparting from the scope of this disclosure. The Detailed Description,therefore, is not to be taken in a limiting sense, and the scope ofvarious embodiments is defined by the appended claims, along with thefull range of equivalents to which such claims are entitled.

FIG. 1. is a schematic diagram of an electrochromic device in accordancewith one embodiment of this inventive concept. Referring to FIG. 1, theelectrochromic device 100 may include an electrochromic layer 102, anelectrolyte layer 103 on the electrochromic layer 102, and a chargestorage layer 104 on the electrolyte layer 103. In some embodiments, theelectrochromic device 100 may further include a first substrate 101beneath the electrochromic layer 102, and a second substrate 105 on thecharge storage layer 104. That is, the electrochromic layer 102, thesolid electrolyte layer 103, and the charge storage layer 104 may besandwiched by the first substrate 101 and the second substrate 105.

The first substrate 101 and the second substrate 105 may be made ofconductive materials and may work as a bottom electrode layer and a topelectrode layer of the electrochromic device 100, respectively. Thus,the first substrate 101 may be termed the bottom electrode layer 101,and the second substrate 105 may be termed the top electrode layer 105in the rest of the application. A voltage may be applied between thebottom electrode layer 101 and the top electrode layer 105, and atransmittance of the electrochromic device may change in response to thevoltage applied between the bottom electrode layer 101 and the topelectrode layer 105.

In some embodiments, the bottom electrode layer 101 and the topelectrode layer 105 may each comprise polyethylene terephthalate (PET)and indium tin oxide (ITO), and may each have a sheet resistance in arange of 0.01 Ω/sq to 200 Ω/sq.

In some embodiments, depending on the voltage applied between the bottomelectrode layer 101 and the top electrode layer 105, the transmittanceof the electrochromic film may range from 0.01% to 99%.

In some embodiments, one of the bottom electrode layer 101 and the topelectrode layer 105 may be a reflective conductive layer, and the otherof the bottom electrode layer 101 and the top electrode layer 105 may bea transparent conductive layer.

The electrochromic device 100 may comprise two states, a bright stateand a dimming state, which may have different reflectivity properties.

FIG. 2. is a three-dimensional exploded structural diagram illustratingan electrochromic device in accordance with one embodiment of thisinventive concept. Referring to FIG. 2, in some embodiments, theelectrochromic device of FIG. 2 may include the electrochromic device100 of FIG. 1, and may further include a bottom glass panel 201 and atop glass panel 205. The electrochromic device 100 of FIG. 1 may besandwiched by the bottom glass panel 201 and the top glass panel 205.That is, the bottom electrode layer, the electrochromic layer, theelectrolyte layer, the charge storage layer, and the top electrode layermay be sandwiched by the bottom glass panel 201 and the top glass panel205. The bottom glass panel 201 and the top glass panel 205 may beadhered to the electrochromic device 100 of FIG. 1 through adhesivelayers 202/204. In one example, the adhesive layers 202/204 may be anyoptically clear adhesive (OCA), PVB, EVA, SentryGlas, etc.

FIGS. 3a and 3b are three-dimensional exploded structural diagramsillustrating electrochromic devices in accordance with one or moreembodiments of this inventive concept. Referring to FIGS. 3a and 3b , insome embodiments, the electrochromic device may include theelectrochromic device of FIG. 2 (the adhesive layers 202/204 are omittedin FIGS. 3a and 3b ), and additionally include a reflective layer 301.The reflective layer 301 may be located either on a upper side of thetop glass 205 panel contacting the top glass panel 205 (as shown in FIG.3a ), or on a bottom side of the top glass panel 205 contacting the topglass panel 205 (as shown in FIG. 3b ). Alternatively, the reflectivelayer 301 may also be located on a side (either an upper side or abottom side) of the bottom glass panel 201 contacting the bottom glasspanel 201. Specific locations of the reflective layer 301 may bedetermined based on actual requirements and are not limited herein.

In some embodiments, the reflective layer 301 may be made of one or moremetallic materials including, but not limited to, silver (Ag), aluminum(Al), chromium (Cr), gold (Au), other suitable metallic material, or anycombination thereof. In some embodiments, the reflective layer 301 maybe a Bragg mirror comprising a plurality of dielectric layers. When anelectrochromic device includes a dedicated reflective layer as shown,for example, in FIGS. 3a and 3b , both the bottom electrode layer andthe top electrode layer will be a transparent conductive layer.

In the embodiments shown in FIGS. 3a and 3b , a dedicated reflectivelayer 301 is provided to reflect light. In some embodiments, thereflective layer 301 may be removed and one of the bottom electrodelayer and the top electrode layer may work as the reflective layer toreflect light. These embodiments will be described below with referenceto FIGS. 4a and 4 b.

FIGS. 4a and 4b are schematic diagrams of electrochromic devices inaccordance with one or more embodiments of this inventive concept. Asshown in FIG. 4a , in some embodiments, the electrochromic device 410may include a bottom electrode layer 101, an electrochromic layer 102 onthe bottom electrode layer 101, a solid electrolyte layer 103 on theelectrochromic layer 102, a charge storage layer 104 on the electrolytelayer 103, and a top electrode layer 105. The characteristics and therelative positional relationship of these component layers may be thesame as those disclosed in the aforementioned embodiments and thus willnot be repeated herein.

As shown in FIG. 4a , in the electrochromic device 410, the bottomelectrode layer 101 may be a reflective conductive layer that reflectsincoming light, and the top electrode layer 105 may be a transparentconductive layer that allows incoming light to pass through. Thusincoming light (indicated by a solid arrow line in FIG. 4a ) to theelectrochromic device 410 may go through the top electrode layer 105 andbe reflected by the bottom electrode layer 101 (a reflected light isindicated by a dash arrow line in FIG. 4a ).

In some embodiments, the solid state electrochromic device 410 mayfurther include a bottom glass panel 401 beneath the bottom electrodelayer 101, and a top glass panel 405 on the top electrode layer 105. Thebottom and the top glass panels may provide support to theelectrochromic device 410 to meet rigidness and toughness requirementsof different applications.

In the electrochromic device shown in FIG. 4a , the bottom electrodelayer 101 is a reflective layer and the top electrode layer 105 is atransparent layer. This inventive concept, however, is not limitedherein. In some embodiments, the bottom electrode layer 101 may be atransparent conductive layer and the top electrode layer 105 may be areflective conductive layer, as shown in FIG. 4b . The electrochromicdevice 420 of FIG. 4b may have the same structure as the electrochromicdevice 410 of FIG. 4a , except that the top electrode layer 105 is areflective conductive layer, and the bottom electrode layer 101 is atransparent conductive layer. Thus, as shown in FIG. 4b , incoming light(indicated by a solid arrow light in FIG. 4b ) to the electrochromicdevice 410 may go through the bottom electrode layer 101 and bereflected by the top electrode layer 105 (a reflected light is indicatedby a dash arrow line in FIG. 4b ). The electrochromic device maycomprise two states, a bright state and a dimming state, which may havedifferent reflectivity properties.

In the embodiments of FIGS. 4a and 4b , rather than providing aseparated reflective layer to reflect light, one of the electrode layersof the electrochromic device may work as a reflect layer to reflectincoming light. Thus, a separated reflective film may be omitted, whichsimplifies the structure of the electrochromic device and themanufacturing process thereof.

This inventive concept further provides an electrochromic devicemanufacturing methods. FIG. 5 is a flowchart illustrating anelectrochromic device manufacturing method in accordance with oneembodiment of this inventive concept. Referring to FIG. 5, themanufacturing method may include the following steps S510 through S570.

In step S510, a bottom substrate may be provided, and an electrochromiclayer may be formed on the bottom substrate.

In step S520, a top substrate may be provided, and a charge storagelayer may be formed on the top substrate.

In some embodiments, the bottom substrate and the top substrate may berigid substrates and may be made of materials including, but not limitedto, glass/ITO. In some embodiments, the bottom substrate and the topsubstrate may be flexible substrates and may be made of materialsincluding, but not limited to, PET/ITO. The bottom substrate and the topsubstrate may be made of conductive materials and may work as a bottomelectrode layer and a top electrode layer of the electrochromic device,respectively, and may each have a sheet resistance in a range of 0.01Ω/sq to 200 Ω/sq.

In step S530, a reflective layer may be formed on a side of one of thebottom substrate and the top substrate. The reflective layer may be madeof one or more metallic materials including, but not limited to, silver(Ag), aluminum (Al), chromium (Cr), gold (Au), other suitable metallicmaterial, or any combination thereof, which is not limited in thisinventive concept.

In step S540, an electrolyte layer may be deposited on theelectrochromic layer on the electrochromic layer the bottom substrate.

In steps S510 through S540, the electrochromic layer, the charge storagelayer, and the electrolyte layer may be formed by deposition, coating,or any other suitable methods that are known to persons or ordinaryskills in the art. For example, in some embodiments, the electrochromiclayer and the electrolyte layer may be sequentially deposited on thebottom substrate using a wet process, such as spin-coating, ink-jetting,slot-die coating, dip-coating, gravure-coating, spray-coating,blade-coating, screen printing, mayer bar coating, relief printing, etc.The charge storage layer may be deposited on the top substrate using awet process, such as spin-coating, ink-jetting, slot-die coating,dip-coating, gravure-coating, spray-coating, blade-coating, screenprinting, mayer bar coating, relief printing, etc. Specific methods thatmay be used to form the electrochromic layer, the charge storage layer,and the electrolyte layer are not limited in this inventive concept.

In step S550, the electrolyte layer on the electrochromic layer may belaminated with the charge storage layer (along with the top substrate).After step S550, the electrochromic layer, the electrolyte layer, andthe charge storage layer are sandwiched by the bottom substrate and thetop substrate.

In step S560, the electrolyte layer may be cured. The electrolyte layermay be cured by UV exposure, heat, pressure, or other suitable methods,and this inventive concept is not limited in this regard. Theelectrochromic layer, the electrolyte layer, and the charge storagelayer may form the electrochromic device. Depending on a voltage appliedbetween the bottom substrate and the top substrate, a transmittance ofthe electrochromic device may range from 0.1% to 99%.

In the aforementioned embodiment, after the electrochromic layer hasbeen formed on the bottom substrate and the charge storage layer hasbeen formed on the top substrate, the electrolyte layer may be depositedon the electrochromic layer, and then maybe laminated by the chargestorage layer (along with the top substrate). This inventive concept isnot limited herein. In one example, the electrolyte layer may bedeposited on the charge storage layer on the top substrate, and then belaminated by the electrochromic layer (along with the bottom substrate).

After Step 560, a top glass panel and a bottom glass panel may furtherbe provided. The top and the bottom glass panels may sandwich theelectrochromic device to provide support to meet rigidness and toughnessrequirements of different applications. Specific characteristics ofcomponent layers may be the same as those described in theaforementioned embodiments, and thus will not be repeated herein. Instep 570, the electrochromic device may be switched between two states,a bright state and a dimming state, which have different reflectivityproperties as further described in FIG. 8.

In some embodiments, the reflective layer may be located on a side ofthe top glass panel or a side of bottom glass panel. Alternatively, theelectrochromic layer may not necessarily include a separated reflectivelayer. Instead, one of the bottom substrate and the top substrate may bea reflective layer while the other of the bottom substrate and the topsubstrate being a transparent layer. Relevant parts of abovedescriptions may be referred to for details, which is not repeatedlydescribed herein.

FIG. 6 is a flowchart illustrating another electrochromic devicemanufacturing method in accordance with one embodiment of this inventiveconcept. Referring to FIG. 6, the electrochromic device manufacturingmethod may include the following steps S610 through S670.

Step S610 and step S620 may be the same with step S510 and step S520,respectively, of the aforementioned embodiment. Relevant parts of theabove description may be referred to for details of these steps, whichare not repeatedly described herein.

In step S630, the bottom substrate (along with the electrochromic layerformed on it) may be fixed to the top substrate (along with the chargestorage layer formed on it), so that a space may be formed between theelectrochromic layer and the charge storage layer. The bottom substratemay be fixed to the top substrate by, for example, gluing the bottomsubstrate to the top substrate. Other methods that can fix the bottomsubstrate to the top substrate are contemplated, and this inventiveconcept is not limited herein. A distance d between the electrochromiclayer and the charge storage layer may be predetermined. In someembodiments, one or more spacers may be provided to maintain thedistance between the electrochromic layer and the charge storage layer.A specific value of the distance may be chosen according to actualrequirements, for example, of a specific application, and is not limitedherein. An opening may be formed at the edge for a subsequent filling-inprocess.

In step S640, the space between the electrochromic layer and the chargestorage layer may be filled with electrolyte liquid by avacuum-and-siphon process which is described in FIG. 7.

In step S650, the opening may be sealed after the filling-in process.

In step S660, the electrolyte liquid in the space may be cured to forman electrolyte layer. The electrolyte liquid in the space may be curedby UV exposure, heat, pressure, or other suitable methods, and thisinventive concept is not limited in this regard.

In step S670, the electrochromic device may be switched between twostates, a bright state and a dimming state, which may have differentreflectivity properties, as will be further described in FIG. 8.

FIG. 7 is a diagram illustrating a vacuum-and-siphon process inaccordance with one embodiment of this inventive concept. For example,the vacuum-and-siphon process may be implemented in step 640 of FIG. 6.Referring to FIG. 7, the vacuum-and-siphon process may include thefollowing steps. First, after the space 710 is created between theelectrochromic layer 702 and the charge storage layer 704, edge seals707 may be added at edge areas of the electrochromic layer 702 and thecharge storage layer 704 to seal the space 710. In some embodiments, oneor more spacers 708 may be provided to maintain a distance between theelectrochromic layer 702 and the charge storage layer 704. Second, thespace 710 may be vacuumed. Vacuuming methods that are well known topersons of ordinary skills in the arts may be used to vacuum the space710, which is not limited herein. Third, electrochromic solution 720 maybe siphoned to the space 710 to fill the space 710, so that anelectrolyte layer between the electrochromic layer 702 and the chargestorage layer 704 may be formed.

FIG. 8 is a diagram illustrating two distinct modes or states inaccordance with embodiments of the electrochromic device described withrespect to FIGS. 1, 2, 3 a, 3 b, 4 a, and 4 b. In FIG. 8, the twodistinct modes or states of the electrochromic device may comprise abright state and a dimming state between which the electrochromic devicemay switch. The bright state and the dimming state have differentreflective properties at specific wavelengths. In some examples, theelectrochromic device in the bright state may have a higher transparencyfor wavelengths between about 380 nm and 780 nm compared to theelectrochromic device in the dimming state.

In some embodiments, the manufacturing method may further includeforming a top glass panel and a bottom glass panel that sandwich theelectrochromic device. This step may be the same as that described inaforementioned embodiments. Relevant parts in those embodiments may bereferred to for details, which will not be repeated herein.

In some embodiments, the manufacturing method may further includeforming a reflective layer. The reflective layer may be located on aside of the top glass panel or a side of bottom glass panel.Alternatively, the electrochromic layer may not necessarily include aseparate reflective layer. In that case, one of the bottom substrate andthe top substrate may be a reflective layer while the other of thebottom substrate and the top substrate may be a transparent layer.Relevant parts of above descriptions may be referred to for details,which will not be repeated herein.

In the manufacturing methods herein disclosed, one of the top electrodelayer and the bottom electrode layer may be a reflective layer forreflecting light, while the other may be a transparent layer. Thesedevices have a simplified structure due to the removal of a separatereflective layer. Since the process of pasting a reflective film in theelectrochromic device is no longer necessary, the manufacturing processmay be simplified. Additionally, in a disclosed manufacturing method, avacuum-and-siphon process may be used to form the electrolyte layer,which may further improve the efficiency of the manufacturing process.

While examples and features of disclosed principles are describedherein, modifications, adaptations, and other implementations arepossible without departing from the spirit and scope of the disclosedembodiments. Also, the words “comprising,” “having,” “containing,” and“including,” and other similar forms are intended to be equivalent inmeaning and be open ended in that an item or items following any one ofthese words is not meant to be an exhaustive listing of such item oritems, or meant to be limited to only the listed item or items. It mustalso be noted that as used herein and in the appended claims, thesingular forms “a,” “an,” and “the” include plural references unless thecontext clearly dictates otherwise.

The embodiments illustrated herein are described in sufficient detail toenable those skilled in the art to practice the teachings disclosed.Other embodiments may be used and derived therefrom, such thatstructural and logical substitutions and changes may be made withoutdeparting from the scope of this disclosure. The Detailed Description,therefore, is not to be taken in a limiting sense, and the scope ofvarious embodiments is defined by the appended claims, along with thefull range of equivalents to which such claims are entitled.

What is claimed is:
 1. An electrochromic device, comprising: a bottomelectrode layer; a top electrode layer; and an electrochromic layer, anelectrolyte layer, and a charge storage layer disposed between thebottom electrode layer and the top electrode layer: a top glass paneland a bottom glass panel, wherein the bottom electrode layer and the topelectrode layer are sandwiched by the top glass panel and the bottomglass panel; and a reflective layer located either on a side of the topglass panel contacting the top glass panel or on a side of the bottomglass panel contacting the bottom glass panel, wherein in response to avoltage applied between the bottom electrode layer and the top electrodelayer, the electrochromic device changes between at least a bright stateand a dimming state, and wherein the bright state has a highertransparency than the dimming state for light wavelengths between 380 nmand 780 nm.
 2. The device of claim 1, wherein the reflective layer is ametallic layer made of Ag, Al, Cr, or Au, or a Bragg mirror comprising aplurality of dielectric layers.
 3. The device of claim 1, wherein thebottom electrode layer and the top electrode layer each have a sheetresistance in a range of 0.01 Ω/sq to 200 Ω/sq.
 4. The device of claim1, wherein a transmittance of the electrochromic device ranges from 0.1%to 99%.
 5. An electrochromic device manufacturing method, comprising:providing a top electrode layer; providing a bottom electrode layer;forming an electrochromic layer, an electrolyte layer, and a chargestorage layer between the bottom electrode layer and the top electrodelayer; and forming a top glass panel and a bottom glass panel betweenwhich the bottom electrode layer and the top electrode layer aresandwiched; and applying a voltage between the bottom electrode layerand the top electrode layer to change the electrochromic device frombetween at least a bright state and a dimming state, wherein the brightstate has a higher transparency than the dimming state for lightwavelengths between 380 nm and 780 nm.
 6. The method of claim 5, whereinthe bottom electrode layer and the top electrode layer each have a sheetresistance in a range of 0.01 Ω/sq to 200 Ω/sq.
 7. The method of claim5, wherein the forming of an electrochromic layer, an electrolyte layer,and a charge storage layer comprises: depositing the charge storagelayer on the top electrode layer using a wet process; and forming theelectrochromic layer on the bottom electrode layer by depositing theelectrochromic layer on the bottom electrode layer using a wet process.8. The method of claim 7, further comprising: forming a reflective layeron a side of the top glass panel contacting the top glass panel, or on aside of the bottom glass panel contacting the bottom glass panel.
 9. Themethod of claim 5, wherein the reflective layer is a metallic layer madeof Ag, Al, Cr, or Au.
 10. The method of claim 5, wherein the reflectivelayer is a Bragg mirror comprising a plurality of dielectric layers. 11.The method of claim 5, wherein one of the bottom electrode layer and thetop electrode layer is a reflective conductive layer, and the other ofthe bottom electrode layer and the top electrode layer is a transparentconductive layer.
 12. The method of claim 5, wherein forming theelectrolyte layer comprises: depositing the electrolyte layer on theelectrochromic layer; laminating the charge storage layer along with thetop electrode on the electrolyte layer; and curing the electrolytelayer.
 13. An electrochromic device manufacturing method, comprising:providing a top electrode layer; forming a charge storage layer on thetop electrode layer; providing a bottom electrode layer; forming anelectrochromic layer on the bottom electrode layer; depositing anelectrolyte layer on the charge storage layer; laminating theelectrochromic layer along with the bottom electrode on the electrolytelayer; curing the electrolyte layer; and applying a voltage between thebottom electrode layer and the top electrode layer to change theelectrochromic device from between at least a bright state and a dimmingstate.
 14. The method of claim 13, wherein the bottom electrode layerand the top electrode layer each have a sheet resistance in a range of0.01 Ω/sq to 200 Ω/sq.
 15. The method of claim 13, wherein the forming acharge storage layer on the top electrode layer comprises: depositingthe charge storage layer on the top electrode layer using a wet process;and wherein the forming an electrochromic layer on the bottom electrodelayer comprises: depositing the electrochromic layer on the bottomelectrode layer using a wet process.
 16. The method of claim 13, furthercomprising: forming a top glass panel and a bottom glass panel, whereinthe bottom electrode layer, the electrochromic layer, the electrolytelayer, the charge storage layer, and the top electrode layer aresandwiched by the top glass panel and the bottom glass panel; andforming a reflective layer on a side of the top glass panel contactingthe top glass panel, or on a side of the bottom glass panel contactingthe bottom glass panel.
 17. The method of claim 13, wherein thereflective layer is a metallic layer made of Ag, Al, Cr, or Au.
 18. Themethod of claim 13, wherein the reflective layer is a Bragg mirrorcomprising a plurality of dielectric layers.
 19. The method of claim 13,wherein one of the bottom electrode layer and the top electrode layer isa reflective conductive layer, and the other of the bottom electrodelayer and the top electrode layer is a transparent conductive layer. 20.The method of claim 19, further comprising: forming a top glass paneland a bottom glass panel, wherein the bottom electrode layer, theelectrochromic layer, the electrolyte layer, the charge storage layer,and the top electrode layer are sandwiched by the top glass panel andthe bottom glass panel.